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dc.contributor.authorWu, Hung-Chien_US
dc.contributor.authorChien, Chao-Hsinen_US
dc.date.accessioned2014-12-08T15:29:30Z-
dc.date.available2014-12-08T15:29:30Z-
dc.date.issued2013-02-11en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4789997en_US
dc.identifier.urihttp://hdl.handle.net/11536/21220-
dc.description.abstractThis work demonstrates In-Ga-Zn-O (IGZO) as source and drain electrodes in IGZO-thin film transistors (TFTs). The fabricated TFT depicts excellent electrical properties; its mobility is 18.02 (cm(2)/V s), threshold voltage (Vth) is 0.3 (V), on/off ratio is 1.63 x 10(8) and subthreshold swing (S. S.) is 239 (mV/decade). We find using rapid thermal annealing treatment can convert IGZO into an effective conductor, and the transparency of IGZO remained almost unchanged. We also find sufficient thermal budget is needed for getting stable transfer curve and output characteristic; otherwise, current fluctuation in on-state can be easily observed. With IGZO electrodes, fully transparent IGZO-TFTs can be thus realized on a glass substrate. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4789997]en_US
dc.language.isoen_USen_US
dc.titleHigh performance InGaZnO thin film transistor with InGaZnO source and drain electrodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.4789997en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume102en_US
dc.citation.issue6en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000315053300034-
dc.citation.woscount8-
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