標題: High performance InGaZnO thin film transistor with InGaZnO source and drain electrodes
作者: Wu, Hung-Chi
Chien, Chao-Hsin
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 11-Feb-2013
摘要: This work demonstrates In-Ga-Zn-O (IGZO) as source and drain electrodes in IGZO-thin film transistors (TFTs). The fabricated TFT depicts excellent electrical properties; its mobility is 18.02 (cm(2)/V s), threshold voltage (Vth) is 0.3 (V), on/off ratio is 1.63 x 10(8) and subthreshold swing (S. S.) is 239 (mV/decade). We find using rapid thermal annealing treatment can convert IGZO into an effective conductor, and the transparency of IGZO remained almost unchanged. We also find sufficient thermal budget is needed for getting stable transfer curve and output characteristic; otherwise, current fluctuation in on-state can be easily observed. With IGZO electrodes, fully transparent IGZO-TFTs can be thus realized on a glass substrate. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4789997]
URI: http://dx.doi.org/10.1063/1.4789997
http://hdl.handle.net/11536/21220
ISSN: 0003-6951
DOI: 10.1063/1.4789997
期刊: APPLIED PHYSICS LETTERS
Volume: 102
Issue: 6
結束頁: 
Appears in Collections:Articles


Files in This Item:

  1. 000315053300034.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.