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dc.contributor.authorTai, Ya-Hsiangen_US
dc.contributor.authorChou, Lu-Shengen_US
dc.contributor.authorKuo, Yan-Fuen_US
dc.contributor.authorYen, Shao-Wenen_US
dc.date.accessioned2014-12-08T15:29:34Z-
dc.date.available2014-12-08T15:29:34Z-
dc.date.issued2011-08-01en_US
dc.identifier.issn1551-319Xen_US
dc.identifier.urihttp://dx.doi.org/10.1109/JDT.2011.2135838en_US
dc.identifier.urihttp://hdl.handle.net/11536/21260-
dc.description.abstractIn this paper, a new photo device are proposed using gap-typed hydrogenated amorphous silicon (a-Si: H) thin-film transistors (TFTs) as backlight sensing circuits. The system employs gap type a-Si TFTs, which has higher photo sensitivity, to sense illumination and increase device dynamic range. Meanwhile, the system with local dimming technologies could attain the purpose for self-adjusting function. It is expected that the integration of this sensing system onto the panel can be implemented without extra process development. Furthermore, the photo leakage characteristics of a-Si TFTs after optical stress are investigated and the corresponding calibration method is proposed to reduce the error in sensing the illumination intensity. This approach would provide the possibility for the sensors array to be integrated into the pixel with the same a-Si TFT device.en_US
dc.language.isoen_USen_US
dc.subjectAmorphous thin-film transistor (TFT)en_US
dc.subjectgap-typeen_US
dc.subjectlight sensoren_US
dc.subjectcircuitsen_US
dc.titleGap-Type a-Si TFTs for Backlight Sensing Applicationen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JDT.2011.2135838en_US
dc.identifier.journalJOURNAL OF DISPLAY TECHNOLOGYen_US
dc.citation.volume7en_US
dc.citation.issue8en_US
dc.citation.spage420en_US
dc.citation.epage425en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000291675500002-
dc.citation.woscount2-
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