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dc.contributor.authorTian, Jr-Shengen_US
dc.contributor.authorWu, Yue-Hanen_US
dc.contributor.authorPeng, Chun-Yenen_US
dc.contributor.authorChiu, Kun-Anen_US
dc.contributor.authorShih, Yi-Senen_US
dc.contributor.authorDo, Hienen_US
dc.contributor.authorLin, Pei-Yinen_US
dc.contributor.authorHo, Yen-Tengen_US
dc.contributor.authorChu, Ying-Haoen_US
dc.contributor.authorChang, Lien_US
dc.date.accessioned2014-12-08T15:29:45Z-
dc.date.available2014-12-08T15:29:45Z-
dc.date.issued2013-03-27en_US
dc.identifier.issn0953-8984en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0953-8984/25/12/125801en_US
dc.identifier.urihttp://hdl.handle.net/11536/21372-
dc.description.abstractThe microstructure of semipolar (11 (2) over bar(2) over bar) ZnO deposited on (112) LaAlO3/(La, Sr) (Al, Ta)O-3 was investigated by transmission electron microscopy. The ZnO shows an in-plane epitaxial relationship of [11 (2) over bar3](ZnO) parallel to [11 (1) over bar](LAO/LSAT) with oxygen-face sense polarity. The misfit strain along [11 (2) over bar3](ZnO) and [1 (1) over bar 00](ZnO) is relieved through the formation of misfit dislocations with the Burgers vectors b = 1/6[11 (2) over bar3](ZnO) and b = 1/3 < 1 (2) over bar 10 >(ZnO), respectively. The line defects in the semipolar ZnO are predominantly perfect dislocations, and the dislocation density decreases with increasing ZnO thickness as a result of dislocation reactions. Planar defects were observed to lie in the M-plane and extend along < 0001 >, whereas basal stacking faults were rarely found.en_US
dc.language.isoen_USen_US
dc.titleDefects in semipolar (11(2)over-bar(2)over-bar) ZnO grown on (112) LaAlO3/(La, Sr) (Al, Ta)O-3 substrate by pulsed laser depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0953-8984/25/12/125801en_US
dc.identifier.journalJOURNAL OF PHYSICS-CONDENSED MATTERen_US
dc.citation.volume25en_US
dc.citation.issue12en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000315598400025-
dc.citation.woscount2-
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