Nanoscale Structure and Mechanism for Enhanced Electromechanical Response of Highly Strained BiFeO(3) Thin Films

doi:10.1002/adma.201101164

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Damodaran, Anoop R.	en_US
dc.contributor.author	Liang, Chen-Wei	en_US
dc.contributor.author	He, Qing	en_US
dc.contributor.author	Peng, Chun-Yen	en_US
dc.contributor.author	Chang, Li	en_US
dc.contributor.author	Chu, Ying-Hao	en_US
dc.contributor.author	Martin, Lane W.	en_US
dc.date.accessioned	2014-12-08T15:29:48Z	-
dc.date.available	2014-12-08T15:29:48Z	-
dc.date.issued	2011-07-26	en_US
dc.identifier.issn	0935-9648	en_US
dc.identifier.uri	http://dx.doi.org/10.1002/adma.201101164	en_US
dc.identifier.uri	http://hdl.handle.net/11536/21394	-
dc.description.abstract	The presence of a variety of structural variants in BiFeO(3) thin films give rise to exotic electric-field-induced responses and resulting electromechanical responses as large as 5%. Using high-resolution X-ray diffraction and scanning-probe-microscopy-based studies the numerous phases present at the phase boundaries are identified and an intermediate monoclinic phase, in addition to the previously observed rhombohedral- and tetragonal-like phases, is discovered.	en_US
dc.language.iso	en_US	en_US
dc.title	Nanoscale Structure and Mechanism for Enhanced Electromechanical Response of Highly Strained BiFeO(3) Thin Films	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1002/adma.201101164	en_US
dc.identifier.journal	ADVANCED MATERIALS	en_US
dc.citation.volume	23	en_US
dc.citation.issue	28	en_US
dc.citation.spage	3170	en_US
dc.citation.epage	+	en_US
dc.contributor.department	材料科學與工程學系	zh_TW
dc.contributor.department	Department of Materials Science and Engineering	en_US
顯示於類別：	期刊論文