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dc.contributor.authorChen, J. Y.en_US
dc.contributor.authorChang, W. -L.en_US
dc.contributor.authorHuang, C. K.en_US
dc.contributor.authorSun, K. W.en_US
dc.date.accessioned2014-12-08T15:30:05Z-
dc.date.available2014-12-08T15:30:05Z-
dc.date.issued2011-07-18en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OE.19.014411en_US
dc.identifier.urihttp://hdl.handle.net/11536/21559-
dc.description.abstractIn this report, we demonstrate the implementation of biomimetic nanostructured antireflection coatings with polymethyl methacrylate (PMMA) layer on the micro-textured surface of silicon crystalline solar cells. To reduce cost, the process combines colloidal lithography, cast molding method, and reversal nanoimprint lithography. The technique is simple, low cost, and does not cause damage to the thin and brittle conventional crystalline solar cells. The antireflection properties of this biomimetic nanostructure coating are considered as effective as those of a conventional single-layer SiN(x) thin film. The resultant structures alone could reduce the average reflectance of solar cell from 13.2% to 7.8% and enhance power conversion efficiency from 12.85% to 14.2%. (C)2011 Optical Society of Americaen_US
dc.language.isoen_USen_US
dc.titleBiomimetic nanostructured antireflection coating and its application on crystalline silicon solar cellsen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OE.19.014411en_US
dc.identifier.journalOPTICS EXPRESSen_US
dc.citation.volume19en_US
dc.citation.issue15en_US
dc.citation.spage14411en_US
dc.citation.epage14419en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000292877600072-
dc.citation.woscount29-
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