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dc.contributor.authorLiu, M. -C.en_US
dc.contributor.authorCheng, Y. -J.en_US
dc.contributor.authorChang, J. -R.en_US
dc.contributor.authorHsu, S. -C.en_US
dc.contributor.authorChang, C. -Y.en_US
dc.date.accessioned2014-12-08T15:30:13Z-
dc.date.available2014-12-08T15:30:13Z-
dc.date.issued2011-07-11en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3610449en_US
dc.identifier.urihttp://hdl.handle.net/11536/21648-
dc.description.abstractWe report the fabrication of GaN lateral polarity inversion heterostructure with self assembled crystalline inversion domain boundaries (IDBs). The sample was fabricated by two step molecular-beam epitaxy (MBE) with microlithography patterning in between to define IDBs. Despite the use of circular pattern, hexagonal crystalline IDBs were self assembled from the circular pattern during the second MBE growth. Both cathodoluminescent (CL) and photoluminescent (PL) measurements show a significant enhanced emission at IDBs and in particular at hexagonal corners. The ability to fabricate self assembled crystalline IDBs and its enhanced emission property can be useful in optoelectronic applications. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3610449]en_US
dc.language.isoen_USen_US
dc.titleOptical properties of self assembled GaN polarity inversion domain boundaryen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3610449en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume99en_US
dc.citation.issue2en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000292777300003-
dc.citation.woscount1-
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