完整後設資料紀錄
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dc.contributor.authorPhuoc Huu Leen_US
dc.contributor.authorWu, Kaung Hsiungen_US
dc.contributor.authorLuo, Chih Weien_US
dc.contributor.authorLeu, Jihperngen_US
dc.date.accessioned2014-12-08T15:30:13Z-
dc.date.available2014-12-08T15:30:13Z-
dc.date.issued2013-05-01en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2013.01.104en_US
dc.identifier.urihttp://hdl.handle.net/11536/21653-
dc.description.abstractBismuth selenide (Bi2Se3) thin films were grown on SrTiO3(111) (STO) substrates using pulsed laser deposition (PLD). The structural, morphological, electrical, and transport properties were studied at various substrate temperatures (T-S) from 120 to 350 degrees C. Amorphous films grown at T-S < 180 degrees C exhibited semiconducting behavior, and highly c-axis-oriented textured films deposited at T-S >= 180 degrees C exhibited metallic behavior. Bi2Se3 thin-films were epitaxially grown on STO substrates at 300 and 350 degrees C. Thickness-dependent characteristics were also investigated for optimized Bi2Se3 films deposited at T-S = 230 degrees C. The semiconducting or metallic characteristics of Bi2Se3 films prepared using PLD were observed through electrical and transport results. (C) 2013 Elsevier B. V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectBi2Se3en_US
dc.subjectTopological insulatoren_US
dc.subjectThin filmen_US
dc.subjectPulsed laser depositionen_US
dc.subjectSrTiO3 substrateen_US
dc.titleGrowth and characterization of topological insulator Bi2Se3 thin films on SrTiO3 using pulsed laser depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.tsf.2013.01.104en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume534en_US
dc.citation.issueen_US
dc.citation.spage659en_US
dc.citation.epage665en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000317736700111-
dc.citation.woscount10-
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