High-Quality 1 eV In(0.3)Ga(0.7)As on GaAs Substrate by Metalorganic Chemical Vapor Deposition for Inverted Metamorphic Solar Cell Application

Abstract

In(0.3)Ga(0.7)As layers were grown by metalorganic chemical vapor deposition using step graded buffer layers on different misoriented GaAs(001) substrates. Smooth-surface In(0.3)Ga(0.7)As film with a root mean square roughness of 1.9 nm was obtained with the growth temperature of 490 degrees C using a 10-step graded parabolic-like indium profile buffer layer on the surface with the 6 degrees-off cut toward the [111] direction. The threading dislocation density in the film was determined to be 1.2 x 10(6) cm(-2) by transmission electron microscopy. The photoluminescence results obtained at 300 and 77K indicate that very low recombination centers existed in the epilayer. (C) 2011 The Japan Society of Applied Physics