完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lin, Je-Wei | en_US |
dc.contributor.author | Wu, Chien-Hung | en_US |
dc.contributor.author | Wu, Sheng-Wei | en_US |
dc.contributor.author | Hseih, Wei-Ping | en_US |
dc.contributor.author | Du, Chen-Hsu | en_US |
dc.contributor.author | Chao, Tien-Sheng | en_US |
dc.date.accessioned | 2014-12-08T15:30:41Z | - |
dc.date.available | 2014-12-08T15:30:41Z | - |
dc.date.issued | 2013-05-01 | en_US |
dc.identifier.issn | 0741-3106 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/LED.2013.2253757 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/21907 | - |
dc.description.abstract | Surface passivation of solar cells is investigated using CF4 plasma treatment on low-temperature oxides to enhance the open-circuit voltage of the solar cells. Low-temperature oxides grown by a nitric acid solution are treated with the CF4 plasma. Solar cells undergoing this scheme show an improved performance, including low-saturation current density and good quantum efficiency at short wavelengths. Experimental results demonstrate that the CF4 plasma pretreatment on low-temperature oxides can significantly improve the open-circuit voltage, short-circuit current, and fill factor for silicon wafer-based solar cells. This technique is very promising for in-line solar cell manufacturing. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | CF4 plasma | en_US |
dc.subject | low-temperature oxides | en_US |
dc.subject | open-circuit voltage | en_US |
dc.subject | surface passivation | en_US |
dc.title | Enhancement of Open-Circuit Voltage Using CF4 Plasma Treatment on Nitric Acid Oxides | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/LED.2013.2253757 | en_US |
dc.identifier.journal | IEEE ELECTRON DEVICE LETTERS | en_US |
dc.citation.volume | 34 | en_US |
dc.citation.issue | 5 | en_US |
dc.citation.spage | 665 | en_US |
dc.citation.epage | 667 | en_US |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:000318433400031 | - |
dc.citation.woscount | 0 | - |
顯示於類別: | 期刊論文 |