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dc.contributor.authorJian, Sheng-Ruien_US
dc.contributor.authorChang, Huang-Weien_US
dc.contributor.authorTseng, Yu-Chinen_US
dc.contributor.authorChen, Ping-Hanen_US
dc.contributor.authorJuang, Jenh-Yihen_US
dc.date.accessioned2014-12-08T15:31:21Z-
dc.date.available2014-12-08T15:31:21Z-
dc.date.issued2013-06-25en_US
dc.identifier.issn1931-7573en_US
dc.identifier.urihttp://dx.doi.org/10.1186/1556-276X-8-297en_US
dc.identifier.urihttp://hdl.handle.net/11536/22279-
dc.description.abstractThe nanomechanical properties of BiFeO3 (BFO) thin films are subjected to nanoindentation evaluation. BFO thin films are grown on the Pt/Ti/SiO2/Si substrates by using radio frequency magnetron sputtering with various deposition temperatures. The structure was analyzed by X-ray diffraction, and the results confirmed the presence of BFO phases. Atomic force microscopy revealed that the average film surface roughness increased with increasing of the deposition temperature. A Berkovich nanoindenter operated with the continuous contact stiffness measurement option indicated that the hardness decreases from 10.6 to 6.8 GPa for films deposited at 350A degrees C and 450A degrees C, respectively. In contrast, Young's modulus for the former is 170.8 GPa as compared to a value of 131.4 GPa for the latter. The relationship between the hardness and film grain size appears to follow closely with the Hall-Petch equation.en_US
dc.language.isoen_USen_US
dc.subjectBiFeO3 thin filmsen_US
dc.subjectXRDen_US
dc.subjectAFMen_US
dc.subjectNanoindentationen_US
dc.subjectHardnessen_US
dc.titleStructural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputteringen_US
dc.typeArticleen_US
dc.identifier.doi10.1186/1556-276X-8-297en_US
dc.identifier.journalNANOSCALE RESEARCH LETTERSen_US
dc.citation.volume8en_US
dc.citation.issueen_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000321281900001-
dc.citation.woscount1-
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