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dc.contributor.authorLin, Yu-Hsuanen_US
dc.contributor.authorHaendel, Benjaminen_US
dc.contributor.authorHuang, Hung Jien_US
dc.contributor.authorChen, Hsiang-Anen_US
dc.contributor.authorChen, Yung-Fuen_US
dc.contributor.authorLin, Heh-Nanen_US
dc.contributor.authorTsai, Din Pingen_US
dc.date.accessioned2014-12-08T15:31:25Z-
dc.date.available2014-12-08T15:31:25Z-
dc.date.issued2013-06-01en_US
dc.identifier.issn1557-1955en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s11468-012-9401-1en_US
dc.identifier.urihttp://hdl.handle.net/11536/22326-
dc.description.abstractIn this work, near-field scanning optical microscopy is employed to study a porous Au film and the direct observation of topographic artifacts and surface plasmon influences is revealed. Under tip illumination, topographic artifacts are found to be present in a reflection mode optical image but not in a transmission mode image. A simple algorithm is used for filtering the topographic artifacts and extracting a correct near-field optical image approximately. On the other hand, surface plasmon influences are present in both modes. By using three exciting wavelengths of 488, 647.1, and 520.8 nm, it is confirmed that a suitable wavelength should be chosen for avoiding the surface plasmon interference in a near-field optical investigation of morphological or material dielectric contrast. Finally, plasmonic or nonplasmonic regions on the porous Au film can be identified from the observed optical intensity variation in the optical images obtained at incident polarizations of 0 degrees, 90 degrees, and 45 degrees.en_US
dc.language.isoen_USen_US
dc.subjectNear-field scanning optical microscopyen_US
dc.subjectPorous gold filmen_US
dc.subjectTopographic artifacten_US
dc.subjectSurface plasmonen_US
dc.titleNear-Field Optical Imaging of a Porous Au Film: Influences of Topographic Artifacts and Surface Plasmonsen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s11468-012-9401-1en_US
dc.identifier.journalPLASMONICSen_US
dc.citation.volume8en_US
dc.citation.issue2en_US
dc.citation.spage377en_US
dc.citation.epage383en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000320445700028-
dc.citation.woscount1-
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