完整後設資料紀錄
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dc.contributor.authorThangavel, R.en_US
dc.contributor.authorYaseen, Mohammad Tariqen_US
dc.contributor.authorChang, Yia Chungen_US
dc.contributor.authorHsu, Chia-Haoen_US
dc.contributor.authorYeh, Kuo-Weien_US
dc.contributor.authorWu, Maw Kuenen_US
dc.date.accessioned2014-12-08T15:31:52Z-
dc.date.available2014-12-08T15:31:52Z-
dc.date.issued2013-11-01en_US
dc.identifier.issn0022-3697en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jpcs.2013.05.020en_US
dc.identifier.urihttp://hdl.handle.net/11536/22508-
dc.description.abstractTransparent conducting polycrystalline Al-doped ZnO (AZO) films were deposited on sapphire substrates at substrate temperatures ranging from 200 to 300 degrees C by pulsed laser deposition (PLD). X-ray diffraction measurement shows that the crystalline quality of AZO films was improved with increased substrate temperature. The electrical and optical properties of the AZO films have been systematically studied via various experimental tools. The room-temperature micro-photoluminescence (mu-PL) spectra show a strong ultraviolet (UV) excitonic emission and weak deep-level emission, which indicate low structural defects in the films. A Raman shift of about 11 cm(-1) is observed for the first-order longitudinal-optical (LO) phonon peak for AZO films when compared to the LO phonon peak of bulk ZnO. The Raman spectra obtained with UV resonant excitation at room temperature show multi-phonon LO modes up to third order. Optical response due to free electrons of the AZO films was characterized in the photon energy range from 0.6 to 6.5 eV by spectroscopic ellipsometry (SE). The free electron response was expressed by a simple Drude model combined with the Cauchy model are reported. (C) 2013 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectThin filmsen_US
dc.subjectRaman spectroscopyen_US
dc.subjectX-ray diffractionen_US
dc.subjectElectrical propertiesen_US
dc.subjectOptical propertiesen_US
dc.titleNear infrared to UV dielectric functions of Al doped ZnO films deposited on c-plane sapphire substrate using pulsed laser depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jpcs.2013.05.020en_US
dc.identifier.journalJOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDSen_US
dc.citation.volume74en_US
dc.citation.issue11en_US
dc.citation.spage1533en_US
dc.citation.epage1537en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000323590000005-
dc.citation.woscount2-
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