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dc.contributor.authorWang, Qiaoqiaoen_US
dc.contributor.authorDyakov, Yuri A.en_US
dc.contributor.authorWu, Dien_US
dc.contributor.authorZhang, Dongdongen_US
dc.contributor.authorJin, Mingxingen_US
dc.contributor.authorLiu, Fuchunen_US
dc.contributor.authorLiu, Hangen_US
dc.contributor.authorHu, Zhanen_US
dc.contributor.authorDing, Dajunen_US
dc.contributor.authorMineo, Hirobumien_US
dc.contributor.authorTeranishi, Yoshiakien_US
dc.contributor.authorChao, Sheng Deren_US
dc.contributor.authorLin, Sheng Hsienen_US
dc.contributor.authorKosheleva, O. K.en_US
dc.contributor.authorMebel, A. M.en_US
dc.date.accessioned2014-12-08T15:32:56Z-
dc.date.available2014-12-08T15:32:56Z-
dc.date.issued2013-10-24en_US
dc.identifier.issn0009-2614en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.cplett.2013.09.009en_US
dc.identifier.urihttp://hdl.handle.net/11536/22966-
dc.description.abstractIonization and dissociation of 2- and 3-methyl cyclopentanones have been investigated in molecular beams by their irradiation with intense 394 and 788 nm laser fields with pulse duration of 90 fs and intensity of 3 x 10(13)-4 x 10(14) W/cm(2). The analysis of the resulting mass spectra allowed us to discern the effects of methyl substitution and its position on the outcome of ionization/dissociation processes induced by the intense femtosecond laser field. Generalized Keldysh-Faisal-Reiss (g-KFR) and ab initio G3(MP2, CCSD)//B3LYP/6-31G*/RRKM theoretical calculations helped to uncover the formation mechanism of major ionic fragments observed in the mass spectra including C5H10+, C4H6O+, C3H3O+, C3H4O+, C3Hx+, and C2Hx+. (C) 2013 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleIonization/dissociation processes of methyl-substituted derivates of cyclopentanone in intense femtosecond laser fielden_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.cplett.2013.09.009en_US
dc.identifier.journalCHEMICAL PHYSICS LETTERSen_US
dc.citation.volume586en_US
dc.citation.issueen_US
dc.citation.spage21en_US
dc.citation.epage28en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000325748900004-
dc.citation.woscount1-
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