完整后设资料纪录
DC 栏位语言
dc.contributor.authorYang, Keng-Chiehen_US
dc.contributor.authorYang, Connaen_US
dc.contributor.authorChao, Pei-Yaoen_US
dc.contributor.authorShih, Po-Hongen_US
dc.date.accessioned2014-12-08T15:33:17Z-
dc.date.available2014-12-08T15:33:17Z-
dc.date.issued2013en_US
dc.identifier.issn1024-123Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/23170-
dc.identifier.urihttp://dx.doi.org/10.1155/2013/210740en_US
dc.description.abstractAdvanced semiconductor processes are produced by very sophisticated and complex machines. The demand of higher precision for the monitoring system is becoming more vital when the devices are shrunk into smaller sizes. The high quality and high solution checking mechanism must rely on the advanced information systems, such as fault detection and classification (FDC). FDC can timely detect the deviations of the machine parameters when the parameters deviate from the original value and exceed the range of the specification. This study adopts backpropagation neural network model and gray relational analysis as tools to analyze the data. This study uses FDC data to detect the semiconductor machine outliers. Data collected for network training are in three different intervals: 6-month period, 3-month period, and one-month period. The results demonstrate that 3-month period has the best result. However, 6-month period has the worst result. The findings indicate that machine deteriorates quickly after continuous use for 6 months. The equipment engineers and managers can take care of this phenomenon and make the production yield better.en_US
dc.language.isoen_USen_US
dc.titleApplying Artificial Neural Network to Predict Semiconductor Machine Outliersen_US
dc.typeArticleen_US
dc.identifier.doi10.1155/2013/210740en_US
dc.identifier.journalMATHEMATICAL PROBLEMS IN ENGINEERINGen_US
dc.contributor.department经营管理研究所zh_TW
dc.contributor.department资讯管理与财务金融系
注:原资管所+财金所
zh_TW
dc.contributor.departmentInstitute of Business and Managementen_US
dc.contributor.departmentDepartment of Information Management and Financeen_US
dc.identifier.wosnumberWOS:000327986100001-
dc.citation.woscount0-
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