完整後設資料紀錄
DC 欄位語言
dc.contributor.authorChen, Po-Chihen_US
dc.contributor.authorChao, Chuen-Guangen_US
dc.contributor.authorJuang, Jenh-Yihen_US
dc.contributor.authorLiu, Tzeng-Fengen_US
dc.date.accessioned2014-12-08T15:33:23Z-
dc.date.available2014-12-08T15:33:23Z-
dc.date.issued2013-12-16en_US
dc.identifier.issn0254-0584en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.matchemphys.2013.08.063en_US
dc.identifier.urihttp://hdl.handle.net/11536/23203-
dc.description.abstractThe as-quenched Fe-9Al-28Mn-1.8C (in wt.%) alloy was directly gas-nitrided at 500 degrees C for 8 h, resulting in a similar to 30 mu m-thick nitrided layer. The nitrided layer consists predominantly of nano-crystalline AlN with a small amount of Fe4N. The nitrogen concentration at surface was extremely high up to similar to 17 wt.% (similar to 41 at.%). Consequently, the surface microhardness (1700 Hv), substrate hardness (550 Hv), ductility (33.2%) and corrosion resistance in 3.5% NaCl solution of the present gas-nitrided alloy are far superior to those obtained previously for the optimally gas-nitrided or plasma-nitrided high-strength alloy steels, as well as martensitic and precipitation-hardening stainless steels. Moreover, it is very novel that the nitrided layer almost remained coherent and adhered well with the matrix after tensile test. Additionally, the present gas nitriding appeared to overcome the edge effects commonly encountered in plasma nitriding treatments for metals. Crown Copyright (C) 2013 Published by Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectAlloysen_US
dc.subjectNanostructuresen_US
dc.subjectNitridesen_US
dc.subjectInterfacesen_US
dc.titleStructure and properties of gas-nitrided nanostructured FeAlMnC alloyen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.matchemphys.2013.08.063en_US
dc.identifier.journalMATERIALS CHEMISTRY AND PHYSICSen_US
dc.citation.volume143en_US
dc.citation.issue1en_US
dc.citation.spage271en_US
dc.citation.epage274en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000327684100037-
dc.citation.woscount0-
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