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dc.contributor.authorChen, Hsiang-Anen_US
dc.contributor.authorHsin, Cheng-Lunen_US
dc.contributor.authorHuang, Yu-Tingen_US
dc.contributor.authorTang, Ming Leeen_US
dc.contributor.authorDhuey, Scotten_US
dc.contributor.authorCabrini, Stefanoen_US
dc.contributor.authorWu, Wen-Weien_US
dc.contributor.authorLeone, Stephen R.en_US
dc.date.accessioned2014-12-08T15:33:42Z-
dc.date.available2014-12-08T15:33:42Z-
dc.date.issued2013-10-31en_US
dc.identifier.issn1932-7447en_US
dc.identifier.urihttp://dx.doi.org/10.1021/jp312363xen_US
dc.identifier.urihttp://hdl.handle.net/11536/23298-
dc.description.abstractThe variation in localized surface plasmon resonances of single Au nanodisks (diameter 100 nm and height 25 nm) on 0-13 graphene layers is investigated using dark-field scattering spectroscopy to obtain the graphene electric field screening length. For nanodisks (NDs) with and without underlying graphene layers on a SiO2 (300 nm)/Si substrate, the plasmon resonance red shifts from 604 to 620 nm with increasing graphene layers. The spectra of the plasmonic nanostructures obey an exponential saturation function versus increasing number of layers of graphene from 0 to 13. As a conducting film, the graphene layers screen the electric field generated by the plasmonic resonance of the Au NDs in the vicinity of the interface, and the red shifts of the resonance wavelength are explained in the framework of the electromagnetic field coupling between in-plane antiparallel image dipoles in the graphene layers and the ND dipole. A screening length of 1.2 +/- 0.2 nm, equivalent to 3-4 graphene layers, is experimentally obtained, in good agreement with the measurement by field-effect transistors and theoretical calculation in doped graphene. The resonance shift of plasmonic nanostructures on a layered graphene system provides an alternative and convenient method for screening length measurement of graphene films.en_US
dc.language.isoen_USen_US
dc.titleMeasurement of Interlayer Screening Length of Layered Graphene by Plasmonic Nanostructure Resonancesen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/jp312363xen_US
dc.identifier.journalJOURNAL OF PHYSICAL CHEMISTRY Cen_US
dc.citation.volume117en_US
dc.citation.issue43en_US
dc.citation.spage22211en_US
dc.citation.epage22217en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000326608200007-
dc.citation.woscount3-
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