1. You are Here：

Full metadata record
DC FieldValueLanguage
dc.contributor.authorHuijben, M.en_US
dc.contributor.authorYu, P.en_US
dc.contributor.authorMartin, L. W.en_US
dc.contributor.authorMolegraaf, H. J. A.en_US
dc.contributor.authorChu, Y. -H.en_US
dc.contributor.authorHolcomb, M. B.en_US
dc.contributor.authorBalke, N.en_US
dc.contributor.authorRijnders, G.en_US
dc.contributor.authorRamesh, R.en_US
dc.date.accessioned2014-12-08T15:33:44Z-
dc.date.available2014-12-08T15:33:44Z-
dc.date.issued2013-09-14en_US
dc.identifier.issn0935-9648en_US
dc.identifier.urihttp://dx.doi.org/10.1002/adma.201300940en_US
dc.identifier.urihttp://hdl.handle.net/11536/23319-
dc.language.isoen_USen_US
dc.subjectexchange biasen_US
dc.subjectinterfaceen_US
dc.subjectoxide heterostructureen_US
dc.subjectmultiferroicen_US
dc.subjectferromagneten_US
dc.titleUltrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfacesen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/adma.201300940en_US
dc.identifier.journalADVANCED MATERIALSen_US
dc.citation.volume25en_US
dc.citation.issue34en_US
dc.citation.spage4739en_US
dc.citation.epage4745en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000327692100014-
dc.citation.woscount6-
Appears in Collections:Articles


Files in This Item:

  1. 000327692100014.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.

Related Contents
Loading...