Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces

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DC 欄位	值	語言
dc.contributor.author	Huijben, M.	en_US
dc.contributor.author	Yu, P.	en_US
dc.contributor.author	Martin, L. W.	en_US
dc.contributor.author	Molegraaf, H. J. A.	en_US
dc.contributor.author	Chu, Y. -H.	en_US
dc.contributor.author	Holcomb, M. B.	en_US
dc.contributor.author	Balke, N.	en_US
dc.contributor.author	Rijnders, G.	en_US
dc.contributor.author	Ramesh, R.	en_US
dc.date.accessioned	2014-12-08T15:33:44Z	-
dc.date.available	2014-12-08T15:33:44Z	-
dc.date.issued	2013-09-14	en_US
dc.identifier.issn	0935-9648	en_US
dc.identifier.uri	http://dx.doi.org/10.1002/adma.201300940	en_US
dc.identifier.uri	http://hdl.handle.net/11536/23319	-
dc.language.iso	en_US	en_US
dc.subject	exchange bias	en_US
dc.subject	interface	en_US
dc.subject	oxide heterostructure	en_US
dc.subject	multiferroic	en_US
dc.subject	ferromagnet	en_US
dc.title	Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1002/adma.201300940	en_US
dc.identifier.journal	ADVANCED MATERIALS	en_US
dc.citation.volume	25	en_US
dc.citation.issue	34	en_US
dc.citation.spage	4739	en_US
dc.citation.epage	4745	en_US
dc.contributor.department	材料科學與工程學系	zh_TW
dc.contributor.department	Department of Materials Science and Engineering	en_US
dc.identifier.wosnumber	WOS:000327692100014	-
dc.citation.woscount	6	-
顯示於類別：	期刊論文

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