标题: | Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces |
作者: | Huijben, M. Yu, P. Martin, L. W. Molegraaf, H. J. A. Chu, Y. -H. Holcomb, M. B. Balke, N. Rijnders, G. Ramesh, R. 材料科学与工程学系 Department of Materials Science and Engineering |
关键字: | exchange bias;interface;oxide heterostructure;multiferroic;ferromagnet |
公开日期: | 14-九月-2013 |
URI: | http://dx.doi.org/10.1002/adma.201300940 http://hdl.handle.net/11536/23319 |
ISSN: | 0935-9648 |
DOI: | 10.1002/adma.201300940 |
期刊: | ADVANCED MATERIALS |
Volume: | 25 |
Issue: | 34 |
起始页: | 4739 |
结束页: | 4745 |
显示于类别: | Articles |
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