标题: Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces
作者: Huijben, M.
Yu, P.
Martin, L. W.
Molegraaf, H. J. A.
Chu, Y. -H.
Holcomb, M. B.
Balke, N.
Rijnders, G.
Ramesh, R.
材料科学与工程学系
Department of Materials Science and Engineering
关键字: exchange bias;interface;oxide heterostructure;multiferroic;ferromagnet
公开日期: 14-九月-2013
URI: http://dx.doi.org/10.1002/adma.201300940
http://hdl.handle.net/11536/23319
ISSN: 0935-9648
DOI: 10.1002/adma.201300940
期刊: ADVANCED MATERIALS
Volume: 25
Issue: 34
起始页: 4739
结束页: 4745
显示于类别:Articles


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