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dc.contributor.authorChen, Yu-Chunen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLi, Hung-Weien_US
dc.contributor.authorChung, Wan-Fangen_US
dc.contributor.authorChen, Shih-Chengen_US
dc.contributor.authorWu, Chang-Peien_US
dc.contributor.authorChen, Yi-Hsienen_US
dc.contributor.authorTai, Ya-Hsiangen_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.contributor.authorYeh(Huang), Fon-Shanen_US
dc.date.accessioned2014-12-08T15:33:46Z-
dc.date.available2014-12-08T15:33:46Z-
dc.date.issued2013-09-01en_US
dc.identifier.issn0257-8972en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.surfcoat.2012.02.057en_US
dc.identifier.urihttp://hdl.handle.net/11536/23335-
dc.description.abstractThis study investigates environmentally dependent electrical performance as a function of hysteresis phenomena for amorphous indium-gallium-zinc-oxide (a-IGZO) thin film transistors (TFTs). Because ambient gas has a great influence on the electrical characteristics of zinc oxide-based TFTs during electrical measurements, the hysteresis for current-voltage and capacitance-voltage measurements are employed in different ambient gases (ambient air, vacuum, oxygen ambient and moisture ambient) to study this issue. Although the hysteresis phenomenon has been explained by the charge trapping and de-trapping model, in order to obtain stable electrical characteristics it is necessary to clarify the original principal mechanism leading to threshold voltage instability under gate bias operations in different environments. Also, the relationship between de-trapping rate and electrical hysteresis is investigated by prolonging the integration time of the semiconductor parameter analyzer. This study may be of importance in explaining the dynamic relationship between the TFT electrical characteristics and ambient gas, as well as providing a better understanding of the environment-dependent hysteresis phenomenon of the IGZO TFTs. (C) 2012 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectIndium gallium zinc oxideen_US
dc.subjectThin film transistorsen_US
dc.subjectHysteresisen_US
dc.titleCharacterization of environment-dependent hysteresis in indium gallium zinc oxide thin film transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.surfcoat.2012.02.057en_US
dc.identifier.journalSURFACE & COATINGS TECHNOLOGYen_US
dc.citation.volume231en_US
dc.citation.issueen_US
dc.citation.spage531en_US
dc.citation.epage534en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000328094200111-
dc.citation.woscount2-
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