標題: | Optical Properties of AlxOy/Ni/AlxOy Multilayered Absorber Coatings Prepared by Reactive DC Magnetron Sputtering |
作者: | Tsai, T. K. Hsueh, S. J. Fang, J. S. 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | AlxOy/Ni/AlxOy;multilayered absorber coating;sputtering;absorptance;thermal emittance |
公開日期: | 1-一月-2014 |
摘要: | Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coatings were deposited on stainless-steel substrates using reactive direct-current (DC) magnetron sputtering. Al (x) O (y) films with different morphologies, structures, and optical transmittances were obtained by varying the DC power and oxygen flux. The Al (x) O (y) films were characterized using field-emission scanning electron microscopy, transmission electron microscopy, energy-dispersive x-ray spectrometry, grazing-incidence x-ray diffraction, and ultraviolet/visible/near-infrared spectrophotometry. The effect of the thickness of the Al (x) O (y) films on the optical properties of Al (x) O (y) /Ni/Al (x) O (y) coatings was also investigated. Experimental results show that the thermal emittance of the Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coatings decreases as the thickness of the Al (x) O (y) top layer is decreased. The Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coating with 70-nm-thick Al (x) O (y) top and bottom layers showed the best optical properties. The thermal stability of the Al (x) O (y) /Ni/Al (x) O (y) multilayered absorber coating in which the Al (x) O (y) films were deposited at conditions of 150 W and 8 sccm O-2 was at least 12 h when the multilayered absorber was annealed at 400A degrees C in air. |
URI: | http://dx.doi.org/10.1007/s11664-013-2829-z http://hdl.handle.net/11536/23392 |
ISSN: | 0361-5235 |
DOI: | 10.1007/s11664-013-2829-z |
期刊: | JOURNAL OF ELECTRONIC MATERIALS |
Volume: | 43 |
Issue: | 1 |
起始頁: | 229 |
結束頁: | 235 |
顯示於類別: | 期刊論文 |