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dc.contributor.authorTiwari, Jitendra N.en_US
dc.contributor.authorTiwari, Rajanish N.en_US
dc.contributor.authorLin, Kunlinen_US
dc.date.accessioned2014-12-08T15:33:58Z-
dc.date.available2014-12-08T15:33:58Z-
dc.date.issued2011-06-01en_US
dc.identifier.issn1998-0124en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s12274-011-0110-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/23400-
dc.description.abstractPerfect platinum (Pt) nanocubes with high density have been synthesized by controlled reduction of hexachloroplatinic acid in the presence of H(2)SO(4) and HCl, employing a pair of low-resistivity fastened silicon (FS) wafers at room temperature. The presence of the additive charges (induced by prior etching of the silicon surface with HF to remove any SiO(2) layer) between the interfaces of the FS surface results in a high charge density and facilitates fast deposition of Pt nanoparticles via electroless plating. The charge density, stirring time, and homogeneity of the aqueous solution influenced the geometrical shapes of the Pt nanoparticles. The parameters were finely tuned in order to control the nucleation and growth rates and obtain perfect Pt nanocubes. The perfect Pt nanocubes were single crystalline with exposed {100} facets. Per equivalent Pt surface areas, the perfect Pt nanocubes showed enhanced catalytic activity relative to truncated Pt nanocubes or spherical Pt nanoparticles for the electrooxidation of liquid feed fuels such as methanol and ethanol. Moreover, there a strong correlation was observed between the optical, electrical, thermal, magnetic, and catalytic properties of the perfect Pt nanocubes which should lead to a variety of technological applications of these materials.en_US
dc.language.isoen_USen_US
dc.subjectFastened silicon wafersen_US
dc.subjectcharge densityen_US
dc.subjectPt nanocubesen_US
dc.subjectcatalytic activityen_US
dc.subjectliquid feed fuel cellsen_US
dc.titleControlled synthesis and growth of perfect platinum nanocubes using a pair of low-resistivity fastened silicon wafers and their electrocatalytic propertiesen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s12274-011-0110-4en_US
dc.identifier.journalNANO RESEARCHen_US
dc.citation.volume4en_US
dc.citation.issue6en_US
dc.citation.spage541en_US
dc.citation.epage549en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000290804100003-
dc.citation.woscount5-
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