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dc.contributor.authorChang, Kuan-en_US
dc.contributor.authorHuang, Jen-weien_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorTsai, Tsung-Mingen_US
dc.contributor.authorChen, Kai-Huangen_US
dc.contributor.authorYoung, Tai-Faen_US
dc.contributor.authorChen, Jung-Huien_US
dc.contributor.authorZhang, Ruien_US
dc.contributor.authorLou, Jen-Chungen_US
dc.contributor.authorHuang, Syuan-Yongen_US
dc.contributor.authorPan, Yin-Chihen_US
dc.contributor.authorHuang, Hui-Chunen_US
dc.contributor.authorSyu, Yong-Enen_US
dc.contributor.authorGan, Der-Shinen_US
dc.contributor.authorBao, Ding-Huaen_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2014-12-08T15:34:04Z-
dc.date.available2014-12-08T15:34:04Z-
dc.date.issued2013-12-11en_US
dc.identifier.issn1556-276Xen_US
dc.identifier.urihttp://dx.doi.org/10.1186/1556-276X-8-523en_US
dc.identifier.urihttp://hdl.handle.net/11536/23417-
dc.description.abstractTo improve the operation current lowing of the Zr:SiO2 RRAM devices, a space electric field concentrated effect established by the porous SiO2 buffer layer was investigated and found in this study. The resistive switching properties of the low-resistance state (LRS) and high-resistance state (HRS) in resistive random access memory (RRAM) devices for the single-layer Zr:SiO2 and bilayer Zr:SiO2/porous SiO2 thin films were analyzed and discussed. In addition, the original space charge limited current (SCLC) conduction mechanism in LRS and HRS of the RRAM devices using bilayer Zr:SiO2/porous SiO2 thin films was found. Finally, a space electric field concentrated effect in the bilayer Zr:SiO2/porous SiO2 RRAM devices was also explained and verified by the COMSOL Multiphysics simulation model.en_US
dc.language.isoen_USen_US
dc.subjectRRAMen_US
dc.subjectPorous SiO2en_US
dc.subjectSpace charge limited currenten_US
dc.subjectZren_US
dc.titleSpace electric field concentrated effect for Zr:SiO2 RRAM devices using porous SiO2 buffer layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1186/1556-276X-8-523en_US
dc.identifier.journalNANOSCALE RESEARCH LETTERSen_US
dc.citation.volume8en_US
dc.citation.issueen_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000329459900001-
dc.citation.woscount5-
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