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dc.contributor.authorHsiao, YNen_US
dc.contributor.authorWhang, WTen_US
dc.contributor.authorLin, SHen_US
dc.date.accessioned2014-12-08T15:34:20Z-
dc.date.available2014-12-08T15:34:20Z-
dc.date.issued2005-02-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.44.914en_US
dc.identifier.urihttp://hdl.handle.net/11536/23511-
dc.description.abstractWe report on the fabrication and experimental characteristics of doping Zinc methylacrylate (ZnMA) and 9,10-phenanthrenequinone (PQ) into a poly(methyl methacrylate) (PMMA) photopolymer. The effects of a ZnMA dopant on the optical and holographic characteristics of ZnMA/PQ/PMMA have been examined. From the optical and holographic measurements of different samples with different composition ratios, we found that the time to reach the maximum diffraction efficiency has been reduced from 102 to 59 (reduced by 1.7 times) and the diffraction efficiency has been raised up from 0.57 to 1.62% (increased by 2.9 times). We also found that holographic gratings can be recorded in pure PQ-doped PMMA, but cannot be recorded in pure ZnMA-doped PMMA. The higher the concentration of PQ in codoped PMMA, the higher the diffraction efficiency. In contrast, the higher ZnMA concentration in the codoped PMMA, the shorter the response time. It is proposed that PQ serves as a photosensitive reactant and plays a major role in the formation of phase gratings. ZnMA serves as a sufficient catalyst to accelerate the reaction of PQ with a polymer or ZnMA. By adding ZnMA with a proper concentration into a PQ/PMMA photopolymer, we succeeded in improving the holographic characteristic of the photopolymer.en_US
dc.language.isoen_USen_US
dc.subjectholographyen_US
dc.subjectvolume holographic materialen_US
dc.subjectdoped PMMA photopolymeren_US
dc.subjectphotopolymeren_US
dc.subjectphenanthrenequinone (PQ)en_US
dc.subjectzinc methylacrylate (ZnMA)en_US
dc.subjectpoly(metyl methacrylate) (PMMA)en_US
dc.titleEffect of ZnMA on optical and holographic characteristics of doped PQ/PMMA photopolymeren_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.44.914en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume44en_US
dc.citation.issue2en_US
dc.citation.spage914en_US
dc.citation.epage919en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000227675300026-
dc.citation.woscount17-
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