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dc.contributor.authorWang, Chieh-Anen_US
dc.contributor.authorChou, Hsin-Pingen_US
dc.contributor.authorCheng, Stoneen_US
dc.contributor.authorChou, Po-Chienen_US
dc.date.accessioned2014-12-08T15:34:47Z-
dc.date.available2014-12-08T15:34:47Z-
dc.date.issued2013en_US
dc.identifier.isbn978-1-4673-5134-8978-1-4673-5135-5en_US
dc.identifier.issn1063-6854en_US
dc.identifier.urihttp://hdl.handle.net/11536/23679-
dc.description.abstractAlGaN/GaN high electron mobility transistors (HEMTs) are one of the prospective candidates for high switching frequency power electronics applications thanks to its wide band gap (3.4eV), high breakdown voltage, large critical electric field, high carrier mobility, and the inherent high speed characteristics. With the high power densities that AlGaN/GaN HEMTs are capable of reaching, heat dissipation is a crucial issue. This paper presents the thermal analysis of packaging development, the device is attached on a V-groove copper base, and mounted on TO-3P leadframe to enhance Si substrate thermal dissipation. The effects of structure design and fabrication processes on the device performance as well as thermal resistance were studied. In addition, micro-Raman/Infrared (IR) thermography was used to investigate temperature profiles and hot spot of the devices. Simulations provide key insights into device operation and the thermal mechanisms that affect reliability. After incorporating self-heating effect in calculations of current-voltage characteristics, our results agreed well with experimental data.en_US
dc.language.isoen_USen_US
dc.titleIn Depth Thermal Analysis of Packaged GaN on Si Power Devicesen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2013 25TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD)en_US
dc.citation.spage101en_US
dc.citation.epage104en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000331229500021-
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