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dc.contributor.authorKuo, WSen_US
dc.contributor.authorWang, CYen_US
dc.contributor.authorTuh, JLen_US
dc.contributor.authorLin, TFen_US
dc.date.accessioned2014-12-08T15:35:46Z-
dc.date.available2014-12-08T15:35:46Z-
dc.date.issued2005-01-15en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2004.09.097en_US
dc.identifier.urihttp://hdl.handle.net/11536/24150-
dc.description.abstractIn this study an experimental flow visualization is carried out to investigate how the substrate inclination affects the buoyancy-induced return flow structure in mixed convection of gas in a horizontal rectangular duct. The return flow is driven by a heated circular disk embedded in the bottom plate of the duct. simulating that in a horizontal longitudinal MOCVD reactor. Specifically, the bottom plate of the duct is inclined so that the gas flow in the duct is accelerated, causing the buoyancy-to-inertia ratio to decrease in the main flow direction. In the experiment. the Reynolds and Rayleigh numbers of the flow at the duct inlet are respectively varied from 3.7 to 79.7 and from 90,40 to 24,000 for the inclined angle of the bottom plate fixed at 0degrees, 0.34degrees and 0.97degrees. Particular attention is paid to delineating the spatial changes of the return flow structure with the plate inclination angle and to how the bottom plate tilting possibly, suppresses and stabilizes the flow. The results show a substantial delay in the onset of the return flow and the effctive suppression of the buoyancy-driven unstable vortex flow by the bottom plate inclination. Besides, the bottom, plate inclination can effectively weaken the return flow at slightly higher Reynolds numbers. An empirical equation is provided to correlate the present data for the onset of the return flow in the duct with its bottom inclined at 0: and 0.97degrees. (C) 2004 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectconvectionen_US
dc.subjectfluid flowsen_US
dc.subjectmetalorganic chemical vapor depositionen_US
dc.titleDelayed onset of return flow by substrate inclination in model horizontal longitudinal MOCVD processesen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jcrysgro.2004.09.097en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.citation.volume274en_US
dc.citation.issue1-2en_US
dc.citation.spage265en_US
dc.citation.epage280en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000226340900038-
dc.citation.woscount2-
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