完整後設資料紀錄
DC 欄位語言
dc.contributor.authorLin, Y. M.en_US
dc.contributor.authorChen, C. H.en_US
dc.contributor.authorLee, C. P.en_US
dc.date.accessioned2014-12-08T15:35:50Z-
dc.date.available2014-12-08T15:35:50Z-
dc.date.issued2014-04-28en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4872138en_US
dc.identifier.urihttp://hdl.handle.net/11536/24221-
dc.description.abstractIon channeling technique using MeV C2+ ions and high resolution X-ray diffraction were used to study the crystal quality of an InAs/AlSb-based quantum wells. We found that the InAs quality has a strong dependence on the type of the interface used. With the addition of the InSb-like interface, the crystal quality of the InAs channel was greatly improved. The InAs lattice was fully strained and aligned with the lattice of the buffer layer without any lattice relaxation. On the other hand, if the interface was of the AlAs type, the lattice of the InAs quantum well was relaxed and the crystal quality was poor. This explains why a superior InAs quantum well with high electron mobility and good surface morphology can be achieved with the use of the InSb interface. (C) 2014 AIP Publishing LLC.en_US
dc.language.isoen_USen_US
dc.titleEffect of interfacial layer on the crystal structure of InAs/AlAs0.16Sb0.84/AlSb quantum wellsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.4872138en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume115en_US
dc.citation.issue16en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department奈米科技中心zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentCenter for Nanoscience and Technologyen_US
dc.identifier.wosnumberWOS:000335228400059-
dc.citation.woscount0-
顯示於類別:期刊論文


文件中的檔案:

  1. 000335228400059.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。