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dc.contributor.authorYu, Tung-Yuanen_US
dc.contributor.authorPan, Fu-Mingen_US
dc.contributor.authorChang, Cheng-Yien_US
dc.contributor.authorHu, Tienen_US
dc.contributor.authorChen, Jenn-Fangen_US
dc.contributor.authorWang, Jia-Fengen_US
dc.contributor.authorLin, Cheng-Luen_US
dc.contributor.authorChen, Tsung-Hanen_US
dc.contributor.authorChen, Te-Mingen_US
dc.date.accessioned2014-12-08T15:36:07Z-
dc.date.available2014-12-08T15:36:07Z-
dc.date.issued2014-05-01en_US
dc.identifier.issn1567-1739en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.cap.2014.02.011en_US
dc.identifier.urihttp://hdl.handle.net/11536/24457-
dc.description.abstractTo study the influence of defects in the hole blocking layer (HBL) on the dark current of amorphous selenium (a-Se) based photosensors, we prepared ZnO thin films by reactive sputter deposition (RSD) for the use as the HBL of the photosensors. The ZnO HBL layers prepared with different oxygen flow rates were characterized by X-ray photoelectron spectroscopy, Raman scattering analysis and photoluminescence, indicating that the density of oxygen vacancies in the ZnO thin films is significantly affected by the oxygen flow rate. The deep level transient spectroscopy measurement reveals two hole trap levels present in the RSD deposited ZnO thin films; one is at 0.94 eV and the other at 0.24 eV above the valence band edge. The electrical performance of the a-Se photosensor is largely influenced by the amount of oxygen vacancies in the ZnO thin film. The a-Se photosensor with the ZnO HBL of the most oxygen vacancies has the lowest dark current and demonstrates the highest breakdown field. (C) 2014 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectZinc oxideen_US
dc.subjectAmorphous Seen_US
dc.subjectHole blocking layeren_US
dc.subjectOxygen vacancyen_US
dc.subjectDLTSen_US
dc.titleDark current suppression of amorphous selenium based photosensors by the ZnO hole blocking layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.cap.2014.02.011en_US
dc.identifier.journalCURRENT APPLIED PHYSICSen_US
dc.citation.volume14en_US
dc.citation.issue5en_US
dc.citation.spage659en_US
dc.citation.epage664en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000335909000005-
dc.citation.woscount1-
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