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dc.contributor.authorDo, Hienen_US
dc.contributor.authorVan-Truong Daien_US
dc.contributor.authorTian, Jr-Shengen_US
dc.contributor.authorYen, Tzu-Chunen_US
dc.contributor.authorChang, Lien_US
dc.date.accessioned2014-12-08T15:36:17Z-
dc.date.available2014-12-08T15:36:17Z-
dc.date.issued2014-07-25en_US
dc.identifier.issn0257-8972en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.surfcoat.2014.03.058en_US
dc.identifier.urihttp://hdl.handle.net/11536/24608-
dc.description.abstractWe investigate the effect of chemical composition and residual stress on the mechanical properties of high-quality epitaxial TiNxOy films deposited on MgO(001) substrates by using nanoindentation. The lattice parameters and residual strain/stress of TiNxOy films decrease as oxygen concentration increases. Hardness and Young\'s modulus determined by nanoindentation are about 17-26 GPa and 355-430 GPa, respectively, which vary with chemical composition and residual stress. (C) 2014 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectEpitaxial titanium oxynitrideen_US
dc.subjectNanoindentationen_US
dc.subjectMechanical propertiesen_US
dc.titleStructural and nanoindentation studies of epitaxial titanium oxynitride (001) films grown on MgO(001) substrateen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.surfcoat.2014.03.058en_US
dc.identifier.journalSURFACE & COATINGS TECHNOLOGYen_US
dc.citation.volume251en_US
dc.citation.issueen_US
dc.citation.spage1en_US
dc.citation.epage6en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000337992100001-
dc.citation.woscount0-
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