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dc.contributor.authorKao, CCen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorHuang, HWen_US
dc.contributor.authorChu, JTen_US
dc.contributor.authorPeng, YCen_US
dc.contributor.authorHsieh, YLen_US
dc.contributor.authorLuo, CYen_US
dc.contributor.authorWang, SCen_US
dc.contributor.authorYu, CCen_US
dc.contributor.authorLin, CFen_US
dc.date.accessioned2014-12-08T15:37:01Z-
dc.date.available2014-12-08T15:37:01Z-
dc.date.issued2005-01-01en_US
dc.identifier.issn1041-1135en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LPT.2004.837480en_US
dc.identifier.urihttp://hdl.handle.net/11536/25427-
dc.description.abstractWe successfully fabricated nitride-based light-emitting diodes (LEDs) with similar to 22degrees undercut sidewalls. The similar to 22degrees etching undercut sidewalls were achieved by controllable inductively coupled plasma reactive ion etching. With a 20-mA current injection, the output powers of the LED with similar to 22degrees undercut sidewalls and standard LED were 5.1 and 3 mW, respectively-a factor of 1.7 times enhancement. It was found that such undercut sidewalls could enhance the probability of escaping the photons outside from the LED in the near horizontal and in-plane directions. This simple and controllable method is beneficial to fabricate brighter LEDs.en_US
dc.language.isoen_USen_US
dc.subjectetching profileen_US
dc.subjectGaNen_US
dc.subjectlight-emitting diode (LED)en_US
dc.subjectlight extraction efficiencyen_US
dc.titleLight-output enhancement in a nitride-based light-emitting diode with 22 degrees undercut sidewallsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LPT.2004.837480en_US
dc.identifier.journalIEEE PHOTONICS TECHNOLOGY LETTERSen_US
dc.citation.volume17en_US
dc.citation.issue1en_US
dc.citation.spage19en_US
dc.citation.epage21en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000226063700006-
dc.citation.woscount61-
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