標題: | Light-output enhancement in a nitride-based light-emitting diode with 22 degrees undercut sidewalls |
作者: | Kao, CC Kuo, HC Huang, HW Chu, JT Peng, YC Hsieh, YL Luo, CY Wang, SC Yu, CC Lin, CF 光電工程學系 Department of Photonics |
關鍵字: | etching profile;GaN;light-emitting diode (LED);light extraction efficiency |
公開日期: | 1-一月-2005 |
摘要: | We successfully fabricated nitride-based light-emitting diodes (LEDs) with similar to 22degrees undercut sidewalls. The similar to 22degrees etching undercut sidewalls were achieved by controllable inductively coupled plasma reactive ion etching. With a 20-mA current injection, the output powers of the LED with similar to 22degrees undercut sidewalls and standard LED were 5.1 and 3 mW, respectively-a factor of 1.7 times enhancement. It was found that such undercut sidewalls could enhance the probability of escaping the photons outside from the LED in the near horizontal and in-plane directions. This simple and controllable method is beneficial to fabricate brighter LEDs. |
URI: | http://dx.doi.org/10.1109/LPT.2004.837480 http://hdl.handle.net/11536/25427 |
ISSN: | 1041-1135 |
DOI: | 10.1109/LPT.2004.837480 |
期刊: | IEEE PHOTONICS TECHNOLOGY LETTERS |
Volume: | 17 |
Issue: | 1 |
起始頁: | 19 |
結束頁: | 21 |
顯示於類別: | 期刊論文 |