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dc.contributor.authorChen, BHen_US
dc.contributor.authorLo, PYen_US
dc.contributor.authorWei, JHen_US
dc.contributor.authorTsai, MJen_US
dc.contributor.authorHwang, CLen_US
dc.contributor.authorChao, TSen_US
dc.contributor.authorLin, HCen_US
dc.contributor.authorHuang, TYen_US
dc.date.accessioned2014-12-08T15:37:06Z-
dc.date.available2014-12-08T15:37:06Z-
dc.date.issued2005en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://hdl.handle.net/11536/25478-
dc.identifier.urihttp://dx.doi.org/10.1149/1.2035696en_US
dc.description.abstractLateral-growth carbon nanotubes (CNTs) were fabricated in a pre-assigned area using an integrated circuit compatible method. In order to synthesize single wall carbon nanotubes (SWNT) for the fabrication of a field-effect transistor (FET), the cobalt-mix-tetraethoxysilane (TEOS) (CMT) solution is proposed. The CMT solution has the unique property of dispersing the cobalt (Co) catalyst well and uniformly embedding it in a predetermined location after the CMT solution has solidified. The lateral growth of bundle-SWNT could be formed in atmospheric chemical vapor deposition (APCVD) with ethanol. (c) 2005 The Electrochemical Society.en_US
dc.language.isoen_USen_US
dc.titleLocalized lateral growth of single-walled carbon nanotubes for field-effect transistors by a cobalt-mix-TEOS methoden_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.2035696en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume8en_US
dc.citation.issue10en_US
dc.citation.spageG290en_US
dc.citation.epageG293en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000231390900045-
dc.citation.woscount3-
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