統計資料
總造訪次數
| 檢視 | |
|---|---|
| Analysis of the effects of reflectance and refraction generated by wafers made from fused silica, ALOxNy and TiSixNy under different light sources on pattern length and best focus | 110 |
本月總瀏覽
| 六月 2025 | 七月 2025 | 八月 2025 | 九月 2025 | 十月 2025 | 十一月 2025 | 十二月 2025 | |
|---|---|---|---|---|---|---|---|
| Analysis of the effects of reflectance and refraction generated by wafers made from fused silica, ALOxNy and TiSixNy under different light sources on pattern length and best focus | 0 | 1 | 0 | 0 | 2 | 1 | 0 |
檔案下載
| 檢視 | |
|---|---|
| 000226566900005.pdf | 7 |
國家瀏覽排行
| 檢視 | |
|---|---|
| 中國 | 96 |
| 美國 | 9 |
| 英國 | 1 |
縣市瀏覽排行
| 檢視 | |
|---|---|
| Shenzhen | 93 |
| Kensington | 4 |
| Beijing | 3 |
| Edmond | 3 |
| Menlo Park | 2 |
| Oldbury | 1 |