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dc.contributor.authorHsiao, RSen_US
dc.contributor.authorWang, JSen_US
dc.contributor.authorLin, KFen_US
dc.contributor.authorWei, Len_US
dc.contributor.authorLiu, HYen_US
dc.contributor.authorLiang, CYen_US
dc.contributor.authorLai, CMen_US
dc.contributor.authorKovsh, ARen_US
dc.contributor.authorMaleev, NAen_US
dc.contributor.authorChi, JYen_US
dc.contributor.authorChen, JFen_US
dc.date.accessioned2014-12-08T15:37:14Z-
dc.date.available2014-12-08T15:37:14Z-
dc.date.issued2004-12-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.43.L1555en_US
dc.identifier.urihttp://hdl.handle.net/11536/25584-
dc.description.abstractThe growth by molecular-beam-epitaxy of high-quality 1.3 mum InGaAsN/GaAs quantum wells (QW) intra-cavity contacted vertical cavity surface emitting lasers (VCSELs) was demonstrated. Low-temperature growth, which suppresses the phase separation significantly improves material quality in the active region. Room-temperature continuous wave (RT-CW) single mode output power of 0.75 mW with an initial slope efficiency of 0.17 W/A and a side mode suppression ratio of 40 dB at a lasing wavelength of as long as 1304 nm were obtained.en_US
dc.language.isoen_USen_US
dc.subjectInGaAsN/GaAs quantum wellsen_US
dc.subjectvertical cavity surface emitting lasersen_US
dc.subjectmolecular beam epitaxyen_US
dc.titleSingle mode 1.3 mu m InGaAsN/GaAs quantum well vertical cavity surface emitting lasers grown by molecular beam epitaxyen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.43.L1555en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERSen_US
dc.citation.volume43en_US
dc.citation.issue12Aen_US
dc.citation.spageL1555en_US
dc.citation.epageL1557en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000226035400016-
dc.citation.woscount10-
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