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dc.contributor.authorHung, C. -T.en_US
dc.contributor.authorChiu, Y. -M.en_US
dc.contributor.authorHwang, F. -N.en_US
dc.contributor.authorChiang, M. -H.en_US
dc.contributor.authorWu, J. -S.en_US
dc.contributor.authorWang, Y. -C.en_US
dc.date.accessioned2014-12-08T15:37:30Z-
dc.date.available2014-12-08T15:37:30Z-
dc.date.issued2011-02-01en_US
dc.identifier.issn0272-4324en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s11090-010-9275-yen_US
dc.identifier.urihttp://hdl.handle.net/11536/25800-
dc.description.abstractThe non-equilibrium atmospheric-pressure parallel-plate helium dielectric barrier discharge (DBD) driven by a realistic 20 kHz distorted-sinusoidal voltage waveform has been investigated by means of simulations and experiments. A self-consistent one-dimensional fluid modeling code considering the non-local electron energy balance was applied to simulate the helium DBD. The effect of selecting plasma chemistry was investigated by comparing simulations with experiments. The results show that the simulations, which include more excited helium, metastable helium and electron-ion-related reaction channels, can faithfully reproduce the measured discharged temporal current quantitatively. Based on the simulated discharge properties, we have found that there is complicated mode transition of discharges from the long Townsend-like to the "dark current"-like, then to the short primary Townsend-like and the short secondary Townsend-like for the helium DBD that is driven by a realistic distorted-sinusoidal voltage power source. Discharge properties in different periods of discharge are discussed in detail in the paper.en_US
dc.language.isoen_USen_US
dc.subjectTownsend-like dischargeen_US
dc.subjectAtmospheric pressure plasmasen_US
dc.subjectHeliumen_US
dc.subjectFluid modellingen_US
dc.subjectDielectric barrier dischargeen_US
dc.titleInvestigation of the Atmospheric Helium Dielectric Barrier Discharge Driven by a Realistic Distorted-Sinusoidal Voltage Power Sourceen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s11090-010-9275-yen_US
dc.identifier.journalPLASMA CHEMISTRY AND PLASMA PROCESSINGen_US
dc.citation.volume31en_US
dc.citation.issue1en_US
dc.citation.spage1en_US
dc.citation.epage21en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000286393100001-
dc.citation.woscount3-
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