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dc.contributor.authorJiang, Jyh-Chiangen_US
dc.contributor.authorLin, Kuan-Hungen_US
dc.contributor.authorLi, Sz-Chien_US
dc.contributor.authorShih, Pao-Mingen_US
dc.contributor.authorHung, Kai-Chanen_US
dc.contributor.authorLin, Sheng Hsienen_US
dc.contributor.authorChang, Hai-Chouen_US
dc.date.accessioned2014-12-08T15:37:37Z-
dc.date.available2014-12-08T15:37:37Z-
dc.date.issued2011-01-28en_US
dc.identifier.issn0021-9606en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3526485en_US
dc.identifier.urihttp://hdl.handle.net/11536/25867-
dc.description.abstractUsing high-pressure infrared methods, we have investigated close interactions of charge-enhanced C-H-O type in ionic liquid/dimethyl sulfoxide (DMSO) mixtures. The solvation and association of the 1-butyl-3-methylimidazolium tetrafluoroborate (BMI(+)BF(4)(-)) and 1-butyl-2,3-dimethylimidazolium tetrafluoroborate (BMM(+)BF(4)(-)) in DMSO-d(6) were examined by analysis of C-H spectral features. Based on our concentration-dependent results, the imidazolium C-H groups are more sensitive sites for C-H-O than the alkyl C-H groups and the dominant imidazolium C-H species in dilute ionic liquid/DMSO-d(6) should be assigned to the isolated (or dissociated) structures. As the dilute mixtures were compressed by high pressures, the loss in intensity of the bands attributed to the isolated structures was observed. In other words, high pressure can be used to perturb the association-dissociation equilibrium in the polar region. This result is remarkably different from what is revealed for the imidazolium C-H in the BMM(+)BF(4)(-)/D(2)O mixtures. DFT-calculations are in agreement with our experimental results indicating that C(4)-H-O and C(5)-H-O interactions seem to play non-negligible roles for BMM(+)BF(4)(-)/DMSO mixtures. (C) 2011 American Institute of Physics. [doi:10.1063/1.3526485]en_US
dc.language.isoen_USen_US
dc.titleAssociation structures of ionic liquid/DMSO mixtures studied by high-pressure infrared spectroscopyen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3526485en_US
dc.identifier.journalJOURNAL OF CHEMICAL PHYSICSen_US
dc.citation.volume134en_US
dc.citation.issue4en_US
dc.citation.epageen_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000286897600072-
dc.citation.woscount17-
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