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dc.contributor.authorChiou, Uio-Puen_US
dc.contributor.authorShieh, Jia-Minen_US
dc.contributor.authorPan, Fu-Mingen_US
dc.contributor.authorHuang, Wen-Hsienen_US
dc.date.accessioned2014-12-08T15:37:43Z-
dc.date.available2014-12-08T15:37:43Z-
dc.date.issued2011en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://hdl.handle.net/11536/25932-
dc.identifier.urihttp://dx.doi.org/10.1149/1.3622290en_US
dc.description.abstractThe study prepared thin film solar cells using hydrogenated microcrystalline silicon (mu c-Si:H) by hot-wire chemical vapor deposition (HWCVD). Hydrogen dilution profiling was used to deposit the boron-doped p-layer on the SnO(2):F substrate. The mu c-Si:H solar cell with triple hydrogen dilution grades in the p-layer has a high photoconversion efficiency of 4.5% as a result of the improvement in the electrical and the antireflection properties of the cell. The short circuit current (J(sc)) and the open circuit voltage (V(oc)) of the solar cell are 19.7 mA/cm(2) and 450 mV, respectively. The graded hydrogen concentration in the p-layer improves the crystallinity and the antireflection of the absorbing layer (intrinsic layer), thereby enhancing the J(sc). The high V(oc) is ascribed to that a high hydrogen dilution ratio may enhance boron doping in the p-layer leading to the improvement of the V(oc). (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3622290] All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectchemical vapour depositionen_US
dc.subjectelemental semiconductorsen_US
dc.subjecthydrogenen_US
dc.subjecthydrogenationen_US
dc.subjectphotovoltaic effectsen_US
dc.subjectsemiconductor thin filmsen_US
dc.subjectsiliconen_US
dc.subjectsolar cellsen_US
dc.titlePhotovoltaic Performance of HWCVD Deposited mu c-Si:H Solar Cells Using Graded Hydrogen Dilution Window-Layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.3622290en_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume158en_US
dc.citation.issue10en_US
dc.citation.spageH1017en_US
dc.citation.epageH1020en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000294063000051-
dc.citation.woscount1-
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