完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chiou, Uio-Pu | en_US |
dc.contributor.author | Shieh, Jia-Min | en_US |
dc.contributor.author | Pan, Fu-Ming | en_US |
dc.contributor.author | Huang, Wen-Hsien | en_US |
dc.date.accessioned | 2014-12-08T15:37:43Z | - |
dc.date.available | 2014-12-08T15:37:43Z | - |
dc.date.issued | 2011 | en_US |
dc.identifier.issn | 0013-4651 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/25932 | - |
dc.identifier.uri | http://dx.doi.org/10.1149/1.3622290 | en_US |
dc.description.abstract | The study prepared thin film solar cells using hydrogenated microcrystalline silicon (mu c-Si:H) by hot-wire chemical vapor deposition (HWCVD). Hydrogen dilution profiling was used to deposit the boron-doped p-layer on the SnO(2):F substrate. The mu c-Si:H solar cell with triple hydrogen dilution grades in the p-layer has a high photoconversion efficiency of 4.5% as a result of the improvement in the electrical and the antireflection properties of the cell. The short circuit current (J(sc)) and the open circuit voltage (V(oc)) of the solar cell are 19.7 mA/cm(2) and 450 mV, respectively. The graded hydrogen concentration in the p-layer improves the crystallinity and the antireflection of the absorbing layer (intrinsic layer), thereby enhancing the J(sc). The high V(oc) is ascribed to that a high hydrogen dilution ratio may enhance boron doping in the p-layer leading to the improvement of the V(oc). (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3622290] All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | chemical vapour deposition | en_US |
dc.subject | elemental semiconductors | en_US |
dc.subject | hydrogen | en_US |
dc.subject | hydrogenation | en_US |
dc.subject | photovoltaic effects | en_US |
dc.subject | semiconductor thin films | en_US |
dc.subject | silicon | en_US |
dc.subject | solar cells | en_US |
dc.title | Photovoltaic Performance of HWCVD Deposited mu c-Si:H Solar Cells Using Graded Hydrogen Dilution Window-Layer | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1149/1.3622290 | en_US |
dc.identifier.journal | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | en_US |
dc.citation.volume | 158 | en_US |
dc.citation.issue | 10 | en_US |
dc.citation.spage | H1017 | en_US |
dc.citation.epage | H1020 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000294063000051 | - |
dc.citation.woscount | 1 | - |
顯示於類別: | 期刊論文 |