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dc.contributor.authorLuo, Dong-Shengen_US
dc.contributor.authorLin, Li-Hungen_US
dc.contributor.authorSu, Yi-Chunen_US
dc.contributor.authorWang, Yi-Tingen_US
dc.contributor.authorPeng, Zai Fongen_US
dc.contributor.authorLo, Shun-Tsungen_US
dc.contributor.authorChen, Kuang Yaoen_US
dc.contributor.authorChang, Yuan Hueien_US
dc.contributor.authorWu, Jau-Yangen_US
dc.contributor.authorLin, Yipingen_US
dc.contributor.authorLin, Sheng-Dien_US
dc.contributor.authorChen, Jeng-Chungen_US
dc.contributor.authorHuang, Chun Fengen_US
dc.contributor.authorLiang, Chi-Teen_US
dc.date.accessioned2014-12-08T15:37:47Z-
dc.date.available2014-12-08T15:37:47Z-
dc.date.issued2011en_US
dc.identifier.issn1931-7573en_US
dc.identifier.urihttp://hdl.handle.net/11536/25984-
dc.identifier.urihttp://dx.doi.org/10.1186/1556-276X-6-139en_US
dc.description.abstractA delta-doped quantum well with additional modulation doping may have potential applications. Utilizing such a hybrid system, it is possible to experimentally realize an extremely high two-dimensional electron gas (2DEG) density without suffering inter-electronic-subband scattering. In this article, the authors report on transport measurements on a delta-doped quantum well system with extra modulation doping. We have observed a 0-10 direct insulator-quantum Hall (I-QH) transition where the numbers 0 and 10 correspond to the insulator and Landau level filling factor nu = 10 QH state, respectively. In situ titled-magnetic field measurements reveal that the observed direct I-QH transition depends on the magnetic component perpendicular to the quantum well, and the electron system within this structure is 2D in nature. Furthermore, transport measurements on the 2DEG of this study show that carrier density, resistance and mobility are approximately temperature (T)-independent over a wide range of T. Such results could be an advantage for applications in T-insensitive devices.en_US
dc.language.isoen_USen_US
dc.titleA delta-doped quantum well system with additional modulation dopingen_US
dc.typeArticleen_US
dc.identifier.doi10.1186/1556-276X-6-139en_US
dc.identifier.journalNANOSCALE RESEARCH LETTERSen_US
dc.citation.volume6en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000290525700049-
dc.citation.woscount6-
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