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dc.contributor.authorHuang, Wen-Tsungen_US
dc.contributor.authorChen, Andrew F.en_US
dc.contributor.authorChen, I-Chengen_US
dc.contributor.authorTsai, Chen-Hsunen_US
dc.contributor.authorLin, Jim Jr-Minen_US
dc.date.accessioned2014-12-08T15:37:49Z-
dc.date.available2014-12-08T15:37:49Z-
dc.date.issued2011en_US
dc.identifier.issn1463-9076en_US
dc.identifier.urihttp://hdl.handle.net/11536/26004-
dc.identifier.urihttp://dx.doi.org/10.1039/c0cp02453hen_US
dc.description.abstractThe dynamics of ClOOCl photodissociation at 248.4 and 308.4 nm was studied with photofragment translational spectroscopy. At 248.4 nm photoexcitation, the observed products are Cl, O(2), ClO and O. Product translational energy distributions P(E) and anisotropy parameters beta were deduced from the measured time-of-flight spectra of the Cl, O(2), and ClO photoproducts. The photodissociation mechanisms have been discussed and compared with available theoretical results. Synchronous and fast sequential breaking of the two Cl-O bonds may both contribute to the dissociation. The relative product yields for [ClO] : [Cl] was measured to be 0.15 +/- 0.04 : 1. The relative amounts of [O] : [O(2)] products were estimated to be 0.12 : 1. The branching ratios among the Cl + O(2) + Cl : ClO + ClO : ClO + Cl + O product channels were estimated to be 0.82 : 0.08 : 0.10. At 308.4 nm excitation, time-of-flight spectra of the O(2) and ClO photoproducts were recorded while there was interference from Cl(2) impurity in detecting the Cl product. Nonetheless, the observed ClO yield relative to the O(2) yield at 308.4 nm is 1.5 times that at 248.4 nm. The branching ratio between the Cl + O(2) + Cl : ClO + ClO product channels was estimated to be 0.81 : 0.19 at 308.4 nm. This result suggests that the ClO product may contribute a noticeable yield in the photolysis of ClOOCl at the atmospherically important wavelengths above 300 nm.en_US
dc.language.isoen_USen_US
dc.titlePhotodissociation dynamics of ClOOCl at 248.4 and 308.4 nmen_US
dc.typeArticleen_US
dc.identifier.doi10.1039/c0cp02453hen_US
dc.identifier.journalPHYSICAL CHEMISTRY CHEMICAL PHYSICSen_US
dc.citation.volume13en_US
dc.citation.issue18en_US
dc.citation.spage8195en_US
dc.citation.epage8203en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000289954300015-
dc.citation.woscount6-
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