標題: Pulsed Electrodeposition of CuInSe(2) Thin Films onto Mo-Glass Substrates
作者: Hu, Shao-Yu
Lee, Wen-Hsi
Chang, Shih-Chieh
Cheng, Yi-Lung
Wang, Ying-Lang
照明與能源光電研究所
Institute of Lighting and Energy Photonics
公開日期: 1-Jan-2011
摘要: In this study, copper indium selenide (CIS) films were deposited by pulsed electrodeposition with multi potentials to control the atomic ratio of the CIS film and improve the deposition uniformity. It was found that smaller duty cycle and pulsed period enhanced the cathodic current due to ion replenishment. The results show that the Cu/In ratio was significantly influenced by reverse voltage of pulsed electrodeposition. The uniformity of the CIS films can be improved by proper reverse voltage. The deposition rate did not decrease in direct proportion to the duty cycle because the plating current was enhanced by the pulse effect. The pulsed deposited CIS film with optimized composition show smaller grain size, smoother microstructure, and less secondary phase than constant deposited film. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3567762] All rights reserved.
URI: http://dx.doi.org/10.1149/1.3567762
http://hdl.handle.net/11536/26024
ISSN: 0013-4651
DOI: 10.1149/1.3567762
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 158
Issue: 5
起始頁: B557
結束頁: B561
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