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dc.contributor.authorYeh, Yen-Hsienen_US
dc.contributor.authorChen, Kuei-Mingen_US
dc.contributor.authorWu, Yin-Haoen_US
dc.contributor.authorHsu, Ying-Chiaen_US
dc.contributor.authorLee, Wei-Ien_US
dc.date.accessioned2014-12-08T15:38:01Z-
dc.date.available2014-12-08T15:38:01Z-
dc.date.issued2011-01-01en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2010.10.063en_US
dc.identifier.urihttp://hdl.handle.net/11536/26100-
dc.description.abstractThe morphology of GaN etched in hydrogen atmosphere is investigated. It is found that GaN surfaces have different profiles after being etched at different pressures. The profile resembles a surface that has been decorated with columns or mooring posts at high pressure and with deep cavities at low pressure. Etch pit density (EPD) experiment shows all dislocations have been etched to form cavities at low pressure, but not all the cavities result from etched dislocations. A model has been developed to explain the mechanism of H(2) etching. Patterned structure with a flat surface and porous inside has been produced by two-step etching which is designed according to the model. (C) 2010 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectHydrogen etchingen_US
dc.subjectSurface processesen_US
dc.subjectSurface structureen_US
dc.subjectHydride vapor phase epitaxyen_US
dc.subjectNitridesen_US
dc.subjectSemiconducting III-V materialsen_US
dc.titleHydrogen etching on the surface of GaN for producing patterned structuresen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jcrysgro.2010.10.063en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.citation.volume314en_US
dc.citation.issue1en_US
dc.citation.spage9en_US
dc.citation.epage12en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000286853400003-
dc.citation.woscount6-
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