Effect of plasma chemistry on the simulation of helium atmospheric-pressure plasmas

doi:10.1016/j.cpc.2010.06.020

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Chiu, Y-M	en_US
dc.contributor.author	Hung, C-T	en_US
dc.contributor.author	Hwang, F-N	en_US
dc.contributor.author	Chiang, M-H	en_US
dc.contributor.author	Wu, J. -S	en_US
dc.contributor.author	Chen, S-H	en_US
dc.date.accessioned	2014-12-08T15:38:09Z	-
dc.date.available	2014-12-08T15:38:09Z	-
dc.date.issued	2011-01-01	en_US
dc.identifier.issn	0010-4655	en_US
dc.identifier.uri	http://dx.doi.org/10.1016/j.cpc.2010.06.020	en_US
dc.identifier.uri	http://hdl.handle.net/11536/26172	-
dc.description.abstract	The effect on the selection of different plasma chemistries for simulating a typical dielectric barrier discharge (DBD) driven by quasi-pulsed power source (20 kHz) is investigated The numerical simulation was performed by using the one-dimensional self-consistent fluid modeling solver Our simulation result indicates that the computed temporal current density can be significantly improved by using a complex version of plasma chemistry module rather than the simple one and demonstrates an excellent agreement with the experimental data The result suggests the metastable excited and ionic helium related reaction channels which are important in simulating a DBD should be taken into account Furthermore it also reveals that the power absorption of ions is considerably higher than that of the electron (C) 2010 Elsevier B V All rights reserved	en_US
dc.language.iso	en_US	en_US
dc.subject	Helium	en_US
dc.subject	Atmospheric-pressure plasma	en_US
dc.subject	Radio frequency	en_US
dc.subject	Quasi-pulsed	en_US
dc.subject	One-dimensional fluid modeling	en_US
dc.title	Effect of plasma chemistry on the simulation of helium atmospheric-pressure plasmas	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1016/j.cpc.2010.06.020	en_US
dc.identifier.journal	COMPUTER PHYSICS COMMUNICATIONS	en_US
dc.citation.volume	182	en_US
dc.citation.issue	1	en_US
dc.citation.spage	167	en_US
dc.citation.epage	169	en_US
dc.contributor.department	機械工程學系	zh_TW
dc.contributor.department	Department of Mechanical Engineering	en_US
dc.identifier.wosnumber	WOS:000285119900053	-
dc.citation.woscount	0	-
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