完整後設資料紀錄
DC 欄位語言
dc.contributor.authorWENG, PKen_US
dc.contributor.authorSHIE, JSen_US
dc.date.accessioned2014-12-08T15:04:07Z-
dc.date.available2014-12-08T15:04:07Z-
dc.date.issued1994-02-01en_US
dc.identifier.issn0034-6748en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1145163en_US
dc.identifier.urihttp://hdl.handle.net/11536/2620-
dc.description.abstractA Pirani vacuum sensor has been fabricated by the silicon micromachining technique. A square glass membrane was formed on (100) silicon substrate with a platinum-film resistor coated. The membrane is suspended by its four leads extended to the corners of an etched cavity. This structure can provide both low thermal loss through leads to the substrate and large active area for gaseous heat conduction. It thus can be used as a highly sensitive vacuum sensor. The fabricated sensor has shown a linear response of pressure from 8X10(-5) to 6 Torr with constant-temperature operation. It is found that the low-pressure limit of the vacuum sensor was caused by the noise of the instrument used in the experiment. A new terminology called ''noise equivalent pressure'' thus is definable due to this finding. The physical limit of the noise equivalent pressure is analyzed. Optimization of the device structure and the noise equivalent pressure are also discussed in detail. A new method of ambient-temperature compensation is also proposed and analyzed here.en_US
dc.language.isoen_USen_US
dc.titleMICRO-PIRANI VACUUM GAUGEen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1145163en_US
dc.identifier.journalREVIEW OF SCIENTIFIC INSTRUMENTSen_US
dc.citation.volume65en_US
dc.citation.issue2en_US
dc.citation.spage492en_US
dc.citation.epage499en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:A1994MX03200037-
dc.citation.woscount38-
顯示於類別:期刊論文