完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wang, SJ | en_US |
dc.contributor.author | Chen, CH | en_US |
dc.contributor.author | Chang, SC | en_US |
dc.contributor.author | Uang, KM | en_US |
dc.contributor.author | Juan, CP | en_US |
dc.contributor.author | Cheng, HC | en_US |
dc.date.accessioned | 2014-12-08T15:38:31Z | - |
dc.date.available | 2014-12-08T15:38:31Z | - |
dc.date.issued | 2004-09-20 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.1791322 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/26371 | - |
dc.description.abstract | In this letter, the growth of dense W2C nanowires by a simple thermal annealing of sputter-deposited WCx films in nitrogen ambient is reported. Straight nanowires with a density of 250-260 mum(-2) and length/diameter in the range of 0.2-0.3 mum/13-15 nm were obtained from the 700degreesC-annealed samples, which exhibit good electron field emission characteristics with a typical turn-on field of about 1.7 V/mum. The self-catalytic growth of W2C nanowires is attributed to the formation of alpha-W2C phase caused by carbon depletion in the WCx films during thermal annealing. (C) 2004 American Institute of Physics. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Growth and characterization of tungsten carbide nanowires by thermal annealing of sputter-deposited WCx films | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.1791322 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 85 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.spage | 2358 | en_US |
dc.citation.epage | 2360 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000224145300068 | - |
dc.citation.woscount | 14 | - |
顯示於類別: | 期刊論文 |