Effect of grain curvature on nano-indentation measurements of thin films

Abstract

Grain curvature effect on the measurement of nano-indentation has been observed for the first time, taking VO2 thin film as an example. As the grain size of thin film is comparable to the diameter of indenter tip, the maximum penetration depths under the same maximum load (P-max) vary and lead to deviations in estimated hardness and Young's modulus. Under the same Pmax, larger penetration depth leads to a larger projected area, and a decrease in hardness. The large deviation of stiffness, affected by surface roughness under low Pmax, produces fluctuation of Young's modulus. Increase in penetration depth diminishes the roughness effect so that deviations in penetration depths dominate the variations in Young's modulus. The hardness and Young's modulus curves measured at lowest penetration depth, being thought to be free from effect of grain curvature, coincide very well to the curves measured by continuous stiffness measurements mode.