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dc.contributor.authorHsiao, YNen_US
dc.contributor.authorWhang, WTen_US
dc.contributor.authorLin, SHen_US
dc.date.accessioned2014-12-08T15:38:34Z-
dc.date.available2014-12-08T15:38:34Z-
dc.date.issued2004-09-01en_US
dc.identifier.issn0091-3286en_US
dc.identifier.urihttp://dx.doi.org/10.1117/1.1774196en_US
dc.identifier.urihttp://hdl.handle.net/11536/26397-
dc.description.abstractThe photoproducts in phenanthrenequinone (PQ)-dissolved methyl methacrylate (MMA) liquid samples and PQ-doped poly(methyl methacrylate) (PQ/PMMA) solid photopolymer samples have been analyzed by various chemical measurements. A mechanism for holographic recording in our PQ/PMMA photopolymer is proposed. By UV-VIS transmission and photoluminescence spectral measurements, we find that under light exposure the molecular structure of PQ is transformed to be less conjugated. The measured results of mass spectra, Fourier transform infrared spectra, NMR spectra, and gel permeation chromatograph of analyses provide some evidence for recognizing the molecular structure of the photoproducts in our PQ/PMMA photopolymers. The results show that under light exposure the PQ and MMA form new molecules, mainly an adduct of one PQ molecule with one MMA molecule. In addition, PQ also reacts as a photoinitiator to form PMMA oligomers in our samples. The structure change of the PQ molecule induces a strong change of the refractive index in the material. It provides a mechanism to record a phase hologram in our PQ/PMMA photopolymer. Holographic recordings in the samples are demonstrated, and the dynamic range of the sample is investigated. (C) 2004 Society of Photo-Optical Instrumentation Engineers.en_US
dc.language.isoen_USen_US
dc.subjectphenanthrenequinoneen_US
dc.subjectmethyl methacrylateen_US
dc.subjectpolymethyl methacrylateen_US
dc.subjectholographic recordingen_US
dc.subjectvolume hologramen_US
dc.titleAnalyses on physical mechanism of holographic recording in phenanthrenequinone-doped poly(methyl methacrylate) hybrid materialsen_US
dc.typeArticleen_US
dc.identifier.doi10.1117/1.1774196en_US
dc.identifier.journalOPTICAL ENGINEERINGen_US
dc.citation.volume43en_US
dc.citation.issue9en_US
dc.citation.spage1993en_US
dc.citation.epage2002en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000223968100008-
dc.citation.woscount45-
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