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dc.contributor.authorCho, CYSen_US
dc.contributor.authorChen, MJen_US
dc.date.accessioned2014-12-08T15:38:54Z-
dc.date.available2014-12-08T15:38:54Z-
dc.date.issued2004-07-01en_US
dc.identifier.issn0916-8524en_US
dc.identifier.urihttp://hdl.handle.net/11536/26642-
dc.description.abstractLow-voltage programmed levels are hard to achieve in multilevel Flash memory using staircase CHEI (channel hot electron injection) programming. The reasons are that low-level programming marginally deviates from the linear relation between threshold voltage V-TH and control gate voltage V-CG. Forward bias enhancement of CHEI is proposed to overcome this drawback. It is demonstrated that the new technique creates a linear relation between V-TH and V-CG, validated down to a critical VCG that is at least I V lower than traditional CHEI. Through extensive measurements, it is further argued that the most suitable magnitude of forward bias is 0.5 V since (i) it produces the lowest program level of 1.4 V; and (ii) higher biases cause not only large current consumption but also worsened drain disturb performance in NOR array configuration. The corresponding linear relation with the unity slope is maintained after 1 05 program/erase cycling.en_US
dc.language.isoen_USen_US
dc.subjectflash memoryen_US
dc.subjectmultilevelen_US
dc.subjectstaircase programmingen_US
dc.titleForward bias enhanced channel hot electron injection for low-level programming improvement in multilevel flash memoryen_US
dc.typeArticleen_US
dc.identifier.journalIEICE TRANSACTIONS ON ELECTRONICSen_US
dc.citation.volumeE87Cen_US
dc.citation.issue7en_US
dc.citation.spage1204en_US
dc.citation.epage1207en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000222585100020-
dc.citation.woscount0-
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