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dc.contributor.authorHsiao, CWen_US
dc.contributor.authorLou, JCen_US
dc.contributor.authorYeh, CFen_US
dc.contributor.authorHsieh, CMen_US
dc.contributor.authorLin, SJen_US
dc.contributor.authorKusumi, Ten_US
dc.date.accessioned2014-12-08T15:39:11Z-
dc.date.available2014-12-08T15:39:11Z-
dc.date.issued2004-05-15en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.43.L659en_US
dc.identifier.urihttp://hdl.handle.net/11536/26774-
dc.description.abstractAirborne molecular contamination (AMC) is becoming increasingly important as devices are scaled down to the nanometer generation. Optimum ultra low penetration air (ULPA) filter technology can eliminate AMC. In a cleanroom, however, the acid vapor generated from the cleaning process may degrade the ULPA filter, releasing AMC to the air and the surface of wafers, degrading the electrical characteristics of devices. This work proposes the new PTFE ULPA filter, which is resistant to acid vapor corrosion, to solve this problem. Experimental results demonstrate that the PTFE ULPA filter can effectively eliminate the AMC and provide a very clean cleanroom environment.en_US
dc.language.isoen_USen_US
dc.subjectcontaminationen_US
dc.subjectglass fiber filteren_US
dc.subjectHF vaporen_US
dc.subjectPTFE filteren_US
dc.subjecttrace dopingen_US
dc.titleImpact of air filter material on metal oxide semiconductor (MOS) device characteristics in HF vapor environmenten_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.43.L659en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERSen_US
dc.citation.volume43en_US
dc.citation.issue5Ben_US
dc.citation.spageL659en_US
dc.citation.epageL661en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000221789000004-
dc.citation.woscount1-
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